Anonymous wrote:Anonymous wrote:Asked and answered a couple of months ago. Hope this helps.
https://www.dcurbanmom.com/jforum/posts/list/1160226.page
Thanks! Yikes!
Anonymous wrote:Anonymous wrote:RPI is a depressing environment and a slog of a college experience, but students get an amazing engineering education and are sought after at most prestigious engineering employers.
It was nearly 40 years ago, but I had the same experience at WPI. Just didn't like the environment of an engineering school, and Worcester was no great place (though maybe arguably better then Troy.)
I lasted a year. Transferred to a state university. Dropped engineering but remained in STEM. Maybe should have stuck with engineering, because I did well in the prerequisite classes. And now I make a mediocre salary lower than what I probably would have made with an engineering degree in a job that is likeable but not loveable to me.
I wish I had had Virginia Tech as an option. A good engineering program within a larger, diverse college community. And a cool little college town.
Anonymous wrote:RPI is a depressing environment and a slog of a college experience, but students get an amazing engineering education and are sought after at most prestigious engineering employers.
Anonymous wrote:My neighbor graduated maybe 5-6 years ago and works for NASA. She loved RPI. Her NASA job resulted from a year long internship she had at Caltech’s NASA lab that she got through the school.
Anonymous wrote:Troy was very isolating and I found the area too depressing. There wasn’t anything around at all. I know people who stayed and liked it but they only cared about academics. I know others that also transferred that wanted more, the area and isolation was too much.
If your kid is just focused on academics or the life there at the college and staying on campus they could be okay. That’s not a bad thing, many are. Spend some time visiting to see.
Anonymous wrote:Asked and answered a couple of months ago. Hope this helps.
https://www.dcurbanmom.com/jforum/posts/list/1160226.page